We have a world-class capability in materials and manufacturing.
We have a world-class capability in materials and manufacturing, spanning technology for the smallest nanostructures to large scale welding methods, as well as composite materials to make stronger and lighter structures. We design and manufacture nonlinear materials that convert energy from near-infrared to the long-wave for infrared laser sources. Other materials we produce are used for ultra-low level detection of chemical warfare agents, target-specific gas mask filtration, anti-tampering, and decontamination.
Our Defense Electronics R&D unit creates advanced components for next generation EW systems and RF and EO/IR sensors, to disrupt and defeat adversary platforms and networks using the full electromagnetic spectrum.
Our ahead-of-the-curve Autonomy R&D keeps our customers ahead of their opponents with rapid problem solving and deployment that puts inventive new capabilities in warfighters' hands while others are still making plans.
Our FAST Labs Electronic Warfare R&D team is unrivaled in advancing innovative RF technologies that deliver clear superiority in EW and C4ISR capabilities across all military platforms, where and when it matters most.
We create signal processing and machine learning algorithms that leverage masses of often underused sensor data to give warfighters and analysts new insights, options, and opportunities for mission success.
Our Tactical Networks R&D team uses advanced resilience-in-depth cyber technologies and protocols to deploy U.S. military wireless tactical networks with autonomic zero-day defense and response security.
The FAST Labs™ R&D group of BAE Systems pushes the limits of what is possible; to create advanced technologies that give our customers the edge they need to win and our employees the chance to change the world.
Our high bandwidth MATRICs™ microwave transceiver platform unites programmable military grade chips and multiple RF technologies into one system that can be reconfigured rapidly, even in harsh environments.